Course Information
Price
HKD 18,000
CEF Reimbursable
CEF Reimbursable
Course Level
Study Mode
Location
-
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Course Overview
Assessment Methods / 評核方式
(A) Assessment Items and Their Weightings: [Continuous Assessment: CA; End-of-Module Assessment: EA] (1) Project Runway - Pattern Drafting and Alteration (CA: 100%; EA: 0%. Breakdown: CA 1/5: Basic Block Construction - Understanding Body Measurement (10%) CA 2/5: Flat Pattern Design and Development 1 (15%) CA 3/5: Flat Pattern Design and Development 2 (15%) CA 4/5: Pattern Develop Practice (20%) CA 5/5: Mock-ups making and alteration (40%)) (2) Project Runway - Pattern Design and Fashion Trends (CA: 100%; EA: 0%. Breakdown: CA 1/5: Ladies Skirt Block (10%) CA 2/5: Ladies Pants Block and Blouse Block (20%) CA 3/5: Various Ladies Styles Pattern Development (20%) CA 4/5: Designed Ladies Skirt Pattern Development in Professional Manner (25%) CA 5/5: Designed Ladies Skirt Mock-up Development (25%)) (3) Project Runway - Professional Pattern Development (CA: 100%; EA: 0%. Breakdown: CA 1/5: Men’s Shirt Pattern Development (15%) CA 2/5: Tailored Jacket Pattern Development (15%) CA 3/5: Tailored Item and Garment Parts Pattern Development (15%) CA 4/5: Designed Jacket Pattern Development in Professional Manner (20%) CA 5/5: Designed Jacket Mock-up Development (35%)) (B) Completion Requirements: (1) Passing mark of 50% or above for each module (C) CEF Reimbursement Requirements: (1) Satisfy the minimum attendance requirement of 70% for each module (2) Passing mark of 50% or above for each module
Entry Requirement / 入學要求
(1) Five HKDSE subjects at Level 2 or above, including English and Chinese Languages, or equivalent; or (2) Five HKCEE subjects at Grade E / Level 2 or above, including English and Chinese Languages, or equivalent; or (3) Mature applicants, i.e. those aged 21 or above with at least two years' relevant working experience, can be admitted.
Instructor's Qualifications / 導師資歷
(1) A recognized relevant honours degree or equivalent professional qualifications; AND (2) At least 3 years relevant working experience.
QR Number / 資歷名冊登記號碼
14/003634/L4
QF Level / 資歷架構級別
4
CEF Registration Invalid From / 基金課程登記失效日期
01-SEP-26
(A) Assessment Items and Their Weightings: [Continuous Assessment: CA; End-of-Module Assessment: EA] (1) Project Runway - Pattern Drafting and Alteration (CA: 100%; EA: 0%. Breakdown: CA 1/5: Basic Block Construction - Understanding Body Measurement (10%) CA 2/5: Flat Pattern Design and Development 1 (15%) CA 3/5: Flat Pattern Design and Development 2 (15%) CA 4/5: Pattern Develop Practice (20%) CA 5/5: Mock-ups making and alteration (40%)) (2) Project Runway - Pattern Design and Fashion Trends (CA: 100%; EA: 0%. Breakdown: CA 1/5: Ladies Skirt Block (10%) CA 2/5: Ladies Pants Block and Blouse Block (20%) CA 3/5: Various Ladies Styles Pattern Development (20%) CA 4/5: Designed Ladies Skirt Pattern Development in Professional Manner (25%) CA 5/5: Designed Ladies Skirt Mock-up Development (25%)) (3) Project Runway - Professional Pattern Development (CA: 100%; EA: 0%. Breakdown: CA 1/5: Men’s Shirt Pattern Development (15%) CA 2/5: Tailored Jacket Pattern Development (15%) CA 3/5: Tailored Item and Garment Parts Pattern Development (15%) CA 4/5: Designed Jacket Pattern Development in Professional Manner (20%) CA 5/5: Designed Jacket Mock-up Development (35%)) (B) Completion Requirements: (1) Passing mark of 50% or above for each module (C) CEF Reimbursement Requirements: (1) Satisfy the minimum attendance requirement of 70% for each module (2) Passing mark of 50% or above for each module
Entry Requirement / 入學要求
(1) Five HKDSE subjects at Level 2 or above, including English and Chinese Languages, or equivalent; or (2) Five HKCEE subjects at Grade E / Level 2 or above, including English and Chinese Languages, or equivalent; or (3) Mature applicants, i.e. those aged 21 or above with at least two years' relevant working experience, can be admitted.
Instructor's Qualifications / 導師資歷
(1) A recognized relevant honours degree or equivalent professional qualifications; AND (2) At least 3 years relevant working experience.
QR Number / 資歷名冊登記號碼
14/003634/L4
QF Level / 資歷架構級別
4
CEF Registration Invalid From / 基金課程登記失效日期
01-SEP-26
What You’ll Learn
(1) Project Runway - Pattern Drafting and Alteration (30 hours) (a) Basic blocks construction (6 hours) (b) Flat pattern design and development (15 hours) (c) Mock-ups making and alteration (6 hours) (d) Professional pattern finishing and presentation (3 hours) (2) Project Runway - Pattern Design and Fashion Trends (30 hours) (a) Current fashion trends (2 hours) (b) Patterns design and mock-ups making for trendy styles (21 hours) (c) Patterns alteration for trendy styles (7 hours) (3) Project Runway - Professional Pattern Development (30 hours) (a) Patterns and samples of tailored garments (3 hours) (b) Patterns and mock-ups making of tailored garments (21 hours) (c) Patterns and mock-ups alteration for tailored garment styles (6 hours)
